G. Hobler, A. Simionescu, F. Jahnel, R. von Criegern, C. Tian, G. Stingeder,
"Verification of Models for the Simulation of Boron Implantation into Crystalline Silicon"
, in Journal of Vacuum Science and Technology B, Seite(n) 272-277, 1996, G. Hobler, A. Simionescu, L. Palmetshofer, F. Jahnel, R.v. Criegern, C. Tian, G. Stingeder: Verification of Models for the Simulation of Boron Implantation into Crystalline Silicon; J. Vac. Sci. Technol. B 14, 272 (1996)
Original Titel:
Verification of Models for the Simulation of Boron Implantation into Crystalline Silicon
Sprache des Titels:
Englisch
Journal:
Journal of Vacuum Science and Technology B
Seitenreferenz:
272-277
Erscheinungsjahr:
1996
Notiz zum Zitat:
G. Hobler, A. Simionescu, L. Palmetshofer, F. Jahnel, R.v. Criegern, C. Tian, G. Stingeder: Verification of Models for the Simulation of Boron Implantation into Crystalline Silicon; J. Vac. Sci. Technol. B 14, 272 (1996)