STED-inspired two-photon lithography of EDOT nanostructures
Sprache des Vortragstitels:
Englisch
Original Tagungtitel:
73rd Annual Meeting of the Austrian Physical Society
Sprache des Tagungstitel:
Englisch
Original Kurzfassung:
In the rapidly evolving field of nanoelectronics, poly(3,4-ethylenedioxythiophene) (PEDOT) stands out among conductive polymers for its high electrical conductivity and thermal stability. However, traditional PEDOT production methods, such as chemical and electrochemical polymerization, often lack the spatial precision needed for advanced nanoelectronic applications.
Multiphoton polymerization (MPP) excels in creating 3D structures in one step, avoiding the traditional layer-by-layer approach. Controlling two-photon absorption with low-energy near-infrared femtosecond laser pulses prevents damage to sensitive materials like organic semiconductors or biomaterials. Although limited by diffraction, super-resolution methods like stimulated emission Depletion (STED) enhance resolution by confining polymerization to the laser's point spread function (PSF) center. For instance, transient absorption depletion (TAD) lithography, inspired by STED, uses long-living transient states to stop polymerization, preventing radical formation or electron transfer from them and refining polymerization to smaller volumes.
In our current study, we implemented these sub-diffraction lithography principles to the oxidative polymerization of EDOT. We discovered that 7-diethylamino-3-thenoylcoumarin (DETC), typically used as a photoinitiator for STED-inspired radical photopolymerization, can also serve as a photosensitizer for EDOT oxidative polymerization. Additionally, using DETC in TAD-lithography enabled us to produce sub-100 nm PEDOT nanostructures.
Forschungs-