Can imaging ellipsometry beat the diffraction limit?
Sprache des Vortragstitels:
Englisch
Original Tagungtitel:
SPIE Photonics West
Sprache des Tagungstitel:
Englisch
Original Kurzfassung:
It will be shown that spectroscopic imaging ellipsometers (SIE) e.g. [1], can determine the number and size of inhomogeneity areas of smaller than 100 x 100 nm2 can be determined with an imaging ellipsometer on a field of view of e.g. a few µm by a few µm. In the contribution I will first discuss, how ellipsometric measurements with an imaging ellipsometer shall be interpreted 1) in the case of no depolarisation and with depolarisation. 2) in the presence of subwavelength defects or structures (Au) of an areal size of e.g. 50 x 50 nm and 10 nm height on Si can be easily detected by SIE, provided the two ellipsometric angles ? and ? are measured with an accuracy of 0.01°. This result proves that the well known sensitivity of ellipsometry on the thickness of vertical overlayers can be extended also to the horizontal dimensions[2,3]. [1] https://www.accurion.com/ [2] J. P. Perin and K. Hingerl, Appl. Surf. Sci., 421, 761 (2017) [3] K. Hingerl, Jour. Appl. Phys. 129, 113101 (2021)
Sprache der Kurzfassung:
Englisch
Vortragstyp:
Hauptvortrag / Eingeladener Vortrag auf einer Tagung