Lithography Hurdles in Physical Design Automation / Prof. Susmita Sur-Kolay
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With the ubiquity of ICs in a plethora of application domains, and their soaring functionality, the feature size is diminishing to the limits of fabrication technology, especially by conventional optical lithography. In this talk, we present some of the approaches being pursued to address the issues in manufacturability. Lithographic techniques such as optical proximity correction and multiple patterning as well as next generation lithography techniques (NGLs) such as electron beam lithography, Extreme Ultra-Violet lithography, Nano-wires with directed self assembly(DSA) can improve the printability to ICs in the sub-14nm range. We then discuss the additional constraints posed by each of these techniques which need to be considered in the physical design phase, and the possible solutions.