Tobias Frischmuth, Michael Schneider, Daniel Maurer, Thomas Grille, Ulrich Schmid,
"High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films"
, in Thin Solid Films, Vol. 611, Elsevier, Seite(n) 6-11, 2016, ISSN: 0040-6090
Original Titel:
High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films