Scanning droplet cell microscopy on a wide range hafnium-niobium thin film combinatorial library
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A wide-range thin film Hf?Nb combinatorial library deposited by co-sputtering is studied. The microstruc-ture and crystallographic properties of the thin film alloys locally investigated by SEM and GIXRD aremapped along the entire compositional spread from 14 to 94 at.% Nb. Scanning droplet cell microscopy(SDCM) is used for mapping the electrochemical properties of the naturally oxidised metallic surfaces.Anodisation of the Hf?Nb thin films alloys is achieved with a high throughput due to computer-controlledscanning, made with a Composition resolution of 1 at.%. The electrical properties of the anodic oxides aremapped by EIS and a maximum electrical permittivity close to 75 was found for Hf?33 at.% Nb. Semi-conducting properties of the mixed anodic oxides are studied using Mott?Schottky analysis and theircomposition and mixing is investigated by XPS depth profiling.