Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp
Sprache des Titels:
The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp ? working stamp ? imprint process where we achieved a resolution of 12.5 nm half pitch. To fabricate master stamps for nanoimprint lithography we use massively parallel ion beam lithography provided by the CHARPAN Tool. Exposed and developed hydrogen silsesquioxane (HSQ) on Si is directly used as a master to fabricate working stamps from UV-curable polymers, which are then used for UV-based nanoimprint lithography.
Sprache der Kurzfassung:
2070 - 2073
Anzahl der Seiten:
Notiz zur Publikation:
<ce:title>Proceedings of the 36th International Conference on Micro- and Nano-Engineering (MNE)</ce:title> <xocs:full-name>36th International Conference on Micro- and Nano-Engineering (MNE)</xocs:full-name>