R. Kullmer, Dieter Bäuerle,
"Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation"
, in Applied Physics A, Vol. 47, Seite(n) 377-386, 1988
Original Titel:
Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation