Abdul Rashid, L. Landström, Klaus Piglmayer,
"Excimer-Laser Surface Processing in CH2I2 Atmospheres: Simultaneous Localized Etching of Si and Deposition of C"
, in Journal of the Electrochemical Society, Vol. 156, Seite(n) D113, 1-2009, ISSN: 1945-7111
Original Titel:
Excimer-Laser Surface Processing in CH2I2 Atmospheres: Simultaneous Localized Etching of Si and Deposition of C