Abdul Rashid, L. Landström, M. Ottosson, Klaus Piglmayer,
"Photothermal CVD of Carbon Thin Films using CH2I2 as the Precursor"
, in Chemical Vapor Deposition, Vol. 14, Seite(n) 279, 1-2008, ISSN: 1521-3862
Original Titel:
Photothermal CVD of Carbon Thin Films using CH2I2 as the Precursor