Dietmar Schroeder, Timm Ostermann, Olaf Kalz,
"Nonlinear Contact Resistance and Inhomogeneous Current Distribution at Ohmic Contacts"
: Proc. 5th Int. Conf. on Simulation of Semiconductor Devices and Processes (SISDEP 93), Springer, Seite(n) pp. 445-448, 9-1993, D. Schroeder, T. Ostermann, O. Kalz. "Nonlinear Contact Resistance and Inhomogeneous Current Distribution at Ohmic Contacts." Proc. 5th Int. Conf. on Simulation of Semiconductor Devices and Processes (SISDEP 93), Sept. 7-9 1993 Vienna, pp. 445-448, Springer, 1993.
Original Titel:
Nonlinear Contact Resistance and Inhomogeneous Current Distribution at Ohmic Contacts
Sprache des Titels:
Englisch
Original Buchtitel:
Proc. 5th Int. Conf. on Simulation of Semiconductor Devices and Processes (SISDEP 93)
Veröffentlicher:
Springer
Seitenreferenz:
pp. 445-448
Erscheinungsmonat:
9
Erscheinungsjahr:
1993
Notiz zum Zitat:
D. Schroeder, T. Ostermann, O. Kalz. "Nonlinear Contact Resistance and Inhomogeneous Current Distribution at Ohmic Contacts." Proc. 5th Int. Conf. on Simulation of Semiconductor Devices and Processes (SISDEP 93), Sept. 7-9 1993 Vienna, pp. 445-448, Springer, 1993.