Title:High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin filmsAuthor(s):Tobias Frischmuth, Michael Schneider, Daniel Maurer, Thomas Grille, Ulrich SchmidJournal:Thin Solid FilmsPublisher:ElsevierISSN:0040-6090Page Reference:page 6-11, 6 page(s)Publishing:2016Volume:611