Title:High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin filmsAuthor(s):Tobias Frischmuth,  Michael Schneider,  Daniel Maurer,  Thomas Grille,  Ulrich SchmidJournal:Thin Solid FilmsPublisher:ElsevierISSN:0040-6090Page Reference:page 6-11, 6 page(s)Publishing:2016Volume:611

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